The process of treating a workpiece’s surface with plasma via chemical or physical actions to achieve contamination removal at the molecular level (typically with a thickness ranging from dozens to hundreds of nanometers) and enhance the workpiece’s surface activity is called plasma cleaning. When a gas reaches a plasma state, gaseous molecules break into numerous highly active particles. The mechanism of plasma cleaning relies on the "activation effect" of substances in the "plasma state" to remove stains from an object’s surface or improve its surface activity. Contaminants that can be removed include organics, epoxy resins, photoresists, oxides, and particulate pollutants. Plasma cleaning is a high-precision micro-cleaning technology; it can solve adhesion challenges and improve the quality of coating, bonding, wetting, printing, and painting.